7EC4 IC TECHNOLOGY |
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Units | Contents of the subjects |
INTRODUCTION TO TECHNOLOGIES- Semiconductor Substrate-Crystal defects, Electronic Grade Silicon, Czochralski Growth, Float Zone Growth, Characterization & evaluation of Crystals; Wafer Preparation- Silicon Shaping, Etching and Polishing, Chemical cleaning. |
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DIFFUSION & ION IMPLANTATION- Ficks diffusion Equation in One |
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CHEMICAL VAPOUR DEPOSITION AND LAYER GROWTH- CVD for deposition of dielectric and polysilicon – a simple CVD system, Chemical equilibrium and the law of mass action, Introduction to atmospheric CVD of dielectric, low pressure CVD of dielectric and semiconductor. Epitaxy-Vapour Phase Expitaxy, Defects in Epitaxial growth, Metal Organic Chemical Vapor Deposition, Molecular beam epitaxy. |
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PATTERN TRANSFER- Introduction to photo/optical lithography, Contact/ proximity printers, Projection printers, Mask generation, photoresists. Wet etching, Plasma etching, Reaction ion etching. |
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VLSI PROCESS INTEGRATION- Junction and Oxide Isolation, LOCOS methods, Trench Isolation, SOI; Metallization, Planarization. Fundamental consideration for IC Processing, NMOS IC Technology, CMOS IC Technology, Bipolar IC Technology. |