5EE6.3 INTRODUCTION TO VLSI
 

1. IC FABRICATION AND THEIR CHARACTERSTICS: Basic monolathic integrated circuits. General IC processing steps:Epitaxial growth, diffusion, photo litho,graphic process,and metallization. Concepts of SSI, LSI, VLSI. Characteristies of linear ICs. Biasing considerations in linear ICs, power requirements and power supplies for linear ICs. Standard bipolar NMOS & CMOS process sequences techniques for process evaluation analysis. In-process measurements.

2. GENERAL PURPOSE IC: (i)Four-quadrant multiplier and its simple applications, CMOS multiplier;voltage regulator IC with feedback. Positive and negative voltage IC regulators. (ii)Linear PLL:Basic theory of first,second and higher order loops, Lock in and lock out process,tracking performance,noise in linear PLL. systems.Important application of linear PLL, measurement of PLL parameters. Digital PLL with intermediate analog signals, all digital and software based PLL.

3. VLSI DESIGN: Relationship between design of IC technology and device models. Symbolic representations. Array and other design approaches.Topic in design-yield and redundancy.Power dissipation & CMOS design, test ability and fault tolerance.

RECOMMENDED BOOKS.

1. S.M. Zee VLSI Technology

2. Stephen A Compbell:The science & Engineering of microelectronic fabrication.

3. James D Plummer;Micheal Deal,and petter B Griffin:Silicon VLSI Technology Fundamental, Practice & Modeling.